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(Referência obtida automaticamente do Web of Science, por meio da informação sobre o financiamento pela FAPESP e o número do processo correspondente, incluída na publicação pelos autores.)

Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass

Texto completo
Autor(es):
Chiappim, W. [1, 2] ; Testoni, G. E. [1, 2] ; Moraes, R. S. [2] ; Pessoa, R. S. [1, 2] ; Sagas, J. C. [3] ; Origo, F. D. [4] ; Vieira, L. [1, 2] ; Maciel, H. S. [1, 2]
Número total de Autores: 8
Afiliação do(s) autor(es):
[1] Univ Vale Paraiba Univap, Nanotechnol & Plasmas Proc Lab, BR-12244000 Sao Jose Dos Campos, SP - Brazil
[2] Inst Tecnol Aeronaut ITA DCTA, Plasma & Proc Lab, BR-12228900 Sao Jose Dos Campos, SP - Brazil
[3] Univ Estadual Santa Catarina UDESC, Lab Plasmas Films & Surfaces, BR-89219710 Joinville, SC - Brazil
[4] Inst Adv Studies IEAV DCTA, BR-12228001 Sao Jose Dos Campos, SP - Brazil
Número total de Afiliações: 4
Tipo de documento: Artigo Científico
Fonte: VACUUM; v. 123, p. 91-102, JAN 2016.
Citações Web of Science: 19
Resumo

TiO2 thin films were deposited on FTO glass by ALD technique using titanium tetrachloride and water as precursors. A thorough investigation of the TiO2/FTO film properties was carried on, varying the process temperature in the range (150-400) degrees C and keeping fixed at 2000 the number of reaction cycles. TiO2 films were also grown on Si(100) and glass substrates for some comparisons. RBS, GIXRD, Raman spectroscopy, SEM, AFM and spectrophotometry analyses were performed to investigate the growth per cycle (GPC), composition, structure, morphology and optical properties of the as-deposited films. Through elemental composition analysis was possible to observe that amorphous and rutile films have a deficiency of oxygen. Pure-anatase TiO2 films can be obtained at process temperatures in the range 250 300 degrees C, while for temperatures higher than 300 degrees C rutile phase starts to appear which turns to unique crystalline phase at temperature higher than 350 degrees C. AFM results shows that FTO substrate tends to restrict the size of crystallite growth, and therefore, the grain size in TiO2 film. The optical parameters of ALD TiO2 films showed very dependent of the change of crystal phase and roughness, allowing to obtain films with distinct properties for dye-sensitized and perovskite-based solar cells. (C) 2015 Elsevier Ltd. All rights reserved. (AU)

Processo FAPESP: 15/05956-0 - 15th International Conference on Atomic Layer Deposition
Beneficiário:Rodrigo Savio Pessoa
Linha de fomento: Auxílio à Pesquisa - Reunião - Exterior
Processo FAPESP: 11/50773-0 - Núcleo de excelência em física e aplicações de plasmas
Beneficiário:Ricardo Magnus Osório Galvão
Linha de fomento: Auxílio à Pesquisa - Temático