Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating

Autor(es)

Chiappim, William ^{[1, 2]} ; Testoni, Giorgio ^[2] ; Miranda, Felipe ^[2] ; Fraga, Mariana ^[3] ; Furlan, Humber ^[4] ; Saravia, David Ardiles ^[5] ; Sobrinho, Argemiro da Silva ^[2] ; Petraconi, Gilberto ^[2] ; Maciel, Homero ^{[6, 2]} ; Pessoa, Rodrigo ^[2]

Afiliação do(s) autor(es)

^[1] Univ Aveiro, Dept Fis, I3N, Campus Univ Santiago, P-3810193 Aveiro - Portugal

^[2] Inst Tecno Aeronaut, Lab Plasmas & Proc, Praca Marechal Eduardo Gomes 50, BR-12228900 Sao Jose Dos Campos, SP - Brazil

^[3] Univ Fed Sao Paulo, Inst Ciencia & Tecnol, Rua Talim 330, BR-12231280 Sao Jose Dos Campos - Brazil

^[4] Programa Posgrad Gestao & Tecnol Sistemas Prod, Ctr Estadual Educ Tecnol Paula Souza, BR-01124010 Sao Paulo - Brazil

^[5] Univ Grenoble Alpes, Lab TIMA, F-38000 Grenoble - France

^[6] Univ Brasil, Inst Cient & Tecnol, BR-08230030 Sao Paulo - Brazil

• Tipo de documento: Artigo Científico
• Fonte: MICROMACHINES; v. 12, n. 6 JUN 2021.
• Citações Web of Science: 0

Resumo

The chemical, structural, morphological, and optical properties of Al-doped TiO2 thin films, called TiO2/Al2O3 nanolaminates, grown by plasma-enhanced atomic layer deposition (PEALD) on p-type Si and commercial SLG glass were discussed. High-quality PEALD TiO2/Al2O3 nanolaminates were produced in the amorphous and crystalline phases. All crystalline nanolaminates have an overabundance of oxygen, while amorphous ones lack oxygen. The superabundance of oxygen on the crystalline film surface was illustrated by a schematic representation that described this phenomenon observed for PEALD TiO2/Al2O3 nanolaminates. The transition from crystalline to amorphous phase increased the surface hardness and the optical gap and decreased the refractive index. Therefore, the doping effect of TiO2 by the insertion of Al2O3 monolayers showed that it is possible to adjust different parameters of the thin-film material and to control, for example, the mobility of the hole-electron pair in the metal-insulator-devices semiconductors, corrosion protection, and optical properties, which are crucial for application in a wide range of technological areas, such as those used to manufacture fluorescence biosensors, photodetectors, and solar cells, among other devices. (AU)

• Processo FAPESP: 20/10450-7 - Explorando o potencial do líquido ativado com plasma (PAL): caracterização do plasma e aplicação do PAL no tratamento endodôntico
• Beneficiário: William Chiappim Junior
• Modalidade de apoio: Bolsas no Brasil - Pós-Doutorado
• Processo FAPESP: 18/01265-1 - Síntese e análise microbiológica de substratos poliméricos recobertos com filmes ultra-finos de TiO2 e/ou Al2O3 pela tecnologia de deposição por camada atômica
• Beneficiário: Rodrigo Savio Pessoa
• Modalidade de apoio: Auxílio à Pesquisa - Regular