Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating

Author(s)

Chiappim, William ^{[1, 2]} ; Testoni, Giorgio ^[2] ; Miranda, Felipe ^[2] ; Fraga, Mariana ^[3] ; Furlan, Humber ^[4] ; Saravia, David Ardiles ^[5] ; Sobrinho, Argemiro da Silva ^[2] ; Petraconi, Gilberto ^[2] ; Maciel, Homero ^{[6, 2]} ; Pessoa, Rodrigo ^[2]

Affiliation

^[1] Univ Aveiro, Dept Fis, I3N, Campus Univ Santiago, P-3810193 Aveiro - Portugal

^[2] Inst Tecno Aeronaut, Lab Plasmas & Proc, Praca Marechal Eduardo Gomes 50, BR-12228900 Sao Jose Dos Campos, SP - Brazil

^[3] Univ Fed Sao Paulo, Inst Ciencia & Tecnol, Rua Talim 330, BR-12231280 Sao Jose Dos Campos - Brazil

^[4] Programa Posgrad Gestao & Tecnol Sistemas Prod, Ctr Estadual Educ Tecnol Paula Souza, BR-01124010 Sao Paulo - Brazil

^[5] Univ Grenoble Alpes, Lab TIMA, F-38000 Grenoble - France

^[6] Univ Brasil, Inst Cient & Tecnol, BR-08230030 Sao Paulo - Brazil

• Document type: Journal article
• Source: MICROMACHINES; v. 12, n. 6 JUN 2021.
• Web of Science Citations: 0

Abstract

The chemical, structural, morphological, and optical properties of Al-doped TiO2 thin films, called TiO2/Al2O3 nanolaminates, grown by plasma-enhanced atomic layer deposition (PEALD) on p-type Si and commercial SLG glass were discussed. High-quality PEALD TiO2/Al2O3 nanolaminates were produced in the amorphous and crystalline phases. All crystalline nanolaminates have an overabundance of oxygen, while amorphous ones lack oxygen. The superabundance of oxygen on the crystalline film surface was illustrated by a schematic representation that described this phenomenon observed for PEALD TiO2/Al2O3 nanolaminates. The transition from crystalline to amorphous phase increased the surface hardness and the optical gap and decreased the refractive index. Therefore, the doping effect of TiO2 by the insertion of Al2O3 monolayers showed that it is possible to adjust different parameters of the thin-film material and to control, for example, the mobility of the hole-electron pair in the metal-insulator-devices semiconductors, corrosion protection, and optical properties, which are crucial for application in a wide range of technological areas, such as those used to manufacture fluorescence biosensors, photodetectors, and solar cells, among other devices. (AU)

• FAPESP's process: 20/10450-7 - Exploring the potential of plasma activated liquid (PAL): characterization of plasma and application of PAL in endodontic treatment
• Grantee: William Chiappim Junior
• Support Opportunities: Scholarships in Brazil - Post-Doctoral
• FAPESP's process: 18/01265-1 - Synthesis and microbiological analysis of polymer substrates coated with TiO2 and / or Al2O3 ultra-thin films by atomic layer deposition technology
• Grantee: Rodrigo Savio Pessoa
• Support Opportunities: Regular Research Grants