Structural and optical properties o plasma-deposited a-C:H:Si:O:N films

Autor(es)

Silveira Costa Lopes, Juliana Feletto ^[1] ; Tardelli, Jean ^[1] ; Rangel, Elidiane Cipriano ^[1] ; Durrant, Steven Frederick ^[1]

Afiliação do(s) autor(es)

^[1] Univ Estadual Paulista UNESP, Inst Ciencia & Tecnol Sorocaba, Lab Plasmas Tecnol, Sorocaba, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: POLIMEROS-CIENCIA E TECNOLOGIA; v. 31, n. 3 2021.
• Citações Web of Science: 0

Resumo

Abstract Thin a-C:H:Si:O:N films were deposited from plasmas fed hexamethyldisiloxane, oxygen and nitrogen, and characterized as a function of the partial pressure of oxygen in the feed, Rox. Deposition rates varied from 10 to 27 nm min-1. Surface roughness was independent of Rox, being around 10 nm. The films contain C=C and C=O, and also Si-C and Si-O-Si groups. Lower [C] and [N] but greater [O] and [Si] were measured in the films as Rox was increased. Refractive indices of ~ 1.5 and optical energy gaps which fell from ~ 3.3 to ~2.3 eV were observed with increasing Rox. The Urbach energy fell with increasing optical gap, which is characteristic of amorphous materials. Such materials have potential as transparent barrier coatings. (AU)

• Processo FAPESP: 17/15853-0 - Caracterização de Filmes Finos Complexos Obtidos por PECVD e a Deposição de Filmes Finos em Substratos Porosos
• Beneficiário: Steven Frederick Durrant
• Modalidade de apoio: Auxílio à Pesquisa - Regular