Structural and optical properties o plasma-deposited a-C:H:Si:O:N films

Author(s)

Silveira Costa Lopes, Juliana Feletto ^[1] ; Tardelli, Jean ^[1] ; Rangel, Elidiane Cipriano ^[1] ; Durrant, Steven Frederick ^[1]

Affiliation

^[1] Univ Estadual Paulista UNESP, Inst Ciencia & Tecnol Sorocaba, Lab Plasmas Tecnol, Sorocaba, SP - Brazil

• Document type: Journal article
• Source: POLIMEROS-CIENCIA E TECNOLOGIA; v. 31, n. 3 2021.
• Web of Science Citations: 0

Abstract

Abstract Thin a-C:H:Si:O:N films were deposited from plasmas fed hexamethyldisiloxane, oxygen and nitrogen, and characterized as a function of the partial pressure of oxygen in the feed, Rox. Deposition rates varied from 10 to 27 nm min-1. Surface roughness was independent of Rox, being around 10 nm. The films contain C=C and C=O, and also Si-C and Si-O-Si groups. Lower [C] and [N] but greater [O] and [Si] were measured in the films as Rox was increased. Refractive indices of ~ 1.5 and optical energy gaps which fell from ~ 3.3 to ~2.3 eV were observed with increasing Rox. The Urbach energy fell with increasing optical gap, which is characteristic of amorphous materials. Such materials have potential as transparent barrier coatings. (AU)

• FAPESP's process: 17/15853-0 - Characterization of Complex Thin Films Obtained by PECVD and the Deposition of Thin Films on Porous Substrates
• Grantee: Steven Frederick Durrant
• Support Opportunities: Regular Research Grants