Characterization of Complex Thin Films Obtained by PECVD and the Deposition of Thin Films on Porous Substrates

• Grant number: 17/15853-0
• Support type: Regular Research Grants
• Duration: July 01, 2018 - October 31, 2020
• Field of knowledge: Engineering - Materials and Metallurgical Engineering - Nonmetallic Materials
• Principal researcher: Steven Frederick Durrant
• Grantee: Steven Frederick Durrant
• Home Institution: Instituto de Ciência e Tecnologia. Universidade Estadual Paulista (UNESP). Campus de Sorocaba. Sorocaba , SP, Brazil

Abstract

Protective hydrophobic, self-cleaning transparent layers may be applied to glass used in windows. Thus, the treated window is protected, and contamination such as particles or other detritus tend to be taken away, for example, by rain droplets, which run down the vertical pane under the action of gravity. For such functions the protective layer must have good adhesion, mechanical resistance, hydrophobicity and optical transparency. The usual methods of production of such films involve the use of several chemical reagents and take a few days. PECVD is more rapid, efficient, and cleaner than these methods. Thin a-C:H:Si:O:N and a-C:H:Si:F:N films show potential as self-cleaning layers. Consequently, one research line of this plan is the production and characterization of this type of film. Static, advancing and receding contact angles will be measured to assess hydrophobicity. Film stoichiometry and structure will be studied using IRS, XPS and EDS. Roughness will be measured by profilometry, AFM or both. Surface morphology will be imaged using SEM. Optical and mechanical properties will be examined by UVS and nanoindentation, respectively. These properties will be studied as a function of the partial pressure of N2, O2 and SF6 in the chamber feed (PN, PO and PS). A second line of study involves PECVD and sputtering of a-C:H:Si:O:N and a-C:H:Si:F:N and similar films on substrates of different porosities. The minimum pore-size in which film can be deposited will be studied as a function of the system parameters (pressure, applied power, etc.). In addition, PECVD will be compared to sputtering of PTFE and silicone for the production of these types of film. Porous stainless steel, bronze or polymeric substrates will be used as structures for self-cleaning material. Silicon-containing films will be studied on porous substrates as anti-reflection coatings. Deposition of silver in porous structures for anti-bacterial applications will also be studied. (AU)

Scientific publications

(5)

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

SILVEIRA COSTA LOPES, JULIANA FELETTO; FURQUIM, FELIPE DE OLIVEIRA; RANGEL, ELIDIANE CIPRIANO; DURRANT, STEVEN F. Characterization of Plasma-deposited a-C:H:Si:F:N Films. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 24, n. 1 2021. Web of Science Citations: 0.

MANOSSO AMORIM, MILENA KOWALCZUK; RANGEL, ELIDIANE CIPRIANO; LANDERS, RICHARD; DURRANT, STEVEN F. Effects of cold SF6 plasma treatment on a-C:H, polypropylene and polystyrene. SURFACE & COATINGS TECHNOLOGY, v. 385, MAR 15 2020. Web of Science Citations: 0.

RAUL RAMOS; MARCIO PERON FRANCO DE GODOY; ELIDIANE CIPRIANO RANGEL; NILSON CRISTINO DA CRUZ; STEVEN F. DURRANT; JOSÉ ROBERTO RIBEIRO BORTOLETO. Co-doped p-type ZnO:Al-N Thin Films Grown by RF-Magnetron Sputtering at Room Temperature. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 23, n. 3, p. -, 2020.

L. P. G. OLIVEIRA; R. RAMOS; W. H. RABELO; E. C. RANGEL; STEVEN F. DURRANT; J. R. R. BORTOLETO. Comparison of RF and Pulsed Magnetron Sputtering for the Deposition of AZO Thin Films on PET. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 23, n. 3, p. -, 2020. Web of Science Citations: 0.

DE OLIVEIRA NETO, ANTONIO M.; SCHREINER, WIDO H.; JUSTO, JOAO F.; DE OLIVEIRA, ALEXANDRE M.; RANGEL, ELIDIANE C.; DURRANT, STEVEN F. Characterization of amorphous carbon films by PECVD and plasma ion implantation: The role of fluorine and sulfur doping. Materials Chemistry and Physics, v. 227, p. 170-175, APR 1 2019. Web of Science Citations: 0.