Enhancing microbiostatic properties of silicone catheters with Al2O3 coatings deposited by atomic layer deposition

Autor(es)

Ballestero, Matheus ; Doria, Anelise C. O. C. ; Pessoa, Rodrigo S. ; Rodrigues, Bruno V. M.

• Tipo de documento: Artigo Científico
• Fonte: Materials Letters; v. 344, p. 5-pg., 2023-04-25.

Resumo

Catheter-associated infections are a concern in healthcare and the leading cause of hospital-acquired infections, which can be caused by a variety of microorganisms, including bacteria and fungi. To prevent severe complications, developing materials with antimicrobial and/or microbiostatic properties is critical. Atomic layer deposition (ALD) is a thin-film deposition technique that precisely controls the thickness and composition of deposited metallic oxide films. ALD is promising for creating biomedical devices, drug delivery systems, and tissue engineering scaffolds with complex geometries. Given the microbiostatic properties of some metallic oxides-coatings, which act hampering the adherence of microorganisms, this work investigated the ALD of Al2O3 thin films on the surface and lumen of silicone catheters. Herein, we showed that Al2O3-coated silicone catheters with a thickness of 100 nm inhibited the formation of biofilm towards Staphylococcus aureus, Escherichia coli and Candida albicans, while reducing the contamination by 1 Log. The low temperature ALD approach presented in this investigation paves the way for further studies on active coatings aiming at biomedical devices with improved microbiostatic properties towards different microorganisms. (AU)

• Processo FAPESP: 20/08485-7 - Cateteres de silicone modificados via técnica de deposição por camada atômica para aplicações neurocirúrgicas
• Beneficiário: Anelise Cristina Osorio Cesar Doria
• Modalidade de apoio: Bolsas no Brasil - Pesquisa Inovativa em Pequenas Empresas - PIPE
• Processo FAPESP: 18/01265-1 - Síntese e análise microbiológica de substratos poliméricos recobertos com filmes ultra-finos de TiO2 e/ou Al2O3 pela tecnologia de deposição por camada atômica
• Beneficiário: Rodrigo Savio Pessoa
• Modalidade de apoio: Auxílio à Pesquisa - Regular
• Processo FAPESP: 19/16685-9 - Cateteres de silicone modificados via técnica de deposição por camada atômica para aplicações neurocirúrgicas
• Beneficiário: Anelise Cristina Osorio Cesar Doria
• Modalidade de apoio: Auxílio à Pesquisa - Pesquisa Inovativa em Pequenas Empresas - PIPE