Surface roughness and wear of resin cements after toothbrush abrasion

Autor(es)

Ishikiriama, Sergio Kiyoshi ; Ordonez-Aguilera, Juan Fernando ; Maenosono, Rafael Massunari ; Amaral Volu, Fernanda Lessa ; Lia Mondelli, Rafael Francisco

• Tipo de documento: Artigo Científico
• Fonte: BRAZILIAN ORAL RESEARCH; v. 29, n. 1, p. 5-pg., 2015-01-01.

Resumo

Increased surface roughness and wear of resin cements may cause failure of indirect restorations. The aim of this study was to evaluate quantitatively the surface roughness change and the vertical wear of four resin cements subjected to mechanical toothbrushing abrasion. Ten rectangular specimens (15 x 5 x 4 mm) were fabricated according to manufacturer instructions for each group (n = 10): Nexus 3, Kerr (NX3); RelyX ARC, 3M ESPE (ARC); RelyX U100, 3M ESPE (U100); and Variolink II, Ivoclar/Vivadent (VL2). Initial roughness (Ra, mu m) was obtained through 5 readings with a roughness meter. Specimens were then subjected to toothbrushing abrasion (100,000 cycles), and further evaluation was conducted for final roughness. Vertical wear (mu m) was quantified by 3 readings of the real profile between control and brushed surfaces. Data were subjected to analysis of variance, followed by Tukey's test (p < 0.05). The Pearson correlation test was performed between the surface roughness change and wear (p < 0.05). The mean values of initial/final roughness (Ra, mu m)/wear (mu m) were as follows: NX3 (0.078/0.127/23.175); ARC (0.086/0.246/20.263); U100 (0.296/0.589/16.952); and VL2 (0.313/0.512/22.876). Toothbrushing abrasion increased surface roughness and wear of all resin cements tested, although no correlation was found between those variables. Vertical wear was similar among groups; however, it was considered high and may lead to gap formation in indirect restorations. (AU)

• Processo FAPESP: 10/14111-0 - Efeito da escovação simulada e da ciclagem de pH na superfície de resinas compostas de diferentes características
• Beneficiário: Sergio Kiyoshi Ishikiriama
• Modalidade de apoio: Auxílio à Pesquisa - Regular