Two-step growth of HFCVD diamond films over large areas

Autor(es)

Amorim, A. ^{[1, 2]} ; Nascente, P. A. P. ^[3] ; Trava-Airoldi, V. J. ^[4] ; Corat, E. J. ^[4] ; Alves, A. R. ^[1] ; Moro, J. R. ^[1]

Afiliação do(s) autor(es)

^[1] Univ Sao Francisco, PPGSS Engn & Ciencia Mat, BR-13251900 Itatiba, SP - Brazil

^[2] FATEC, BR-13801005 Mogi Mirim, SP - Brazil

^[3] Univ Fed Sao Carlos, Dept Mat Engn, BR-13565905 Sao Carlos, SP - Brazil

^[4] Inst Nacl Pesquisas Espaciais, Lab Assoc Sensores & Mat, BR-12227970 Sao Jose Dos Campos, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: VACUUM; v. 83, n. 7, p. 1054-1056, MAR 24 2009.
• Citações Web of Science: 4

Resumo

This paper reports the results of a two-step hot filament chemical vapor deposition method to improve the quality of diamond films. Diamond films were deposited on a Si(100) substrate having an area of 45 cm(2) and a thickness of 60 mu m. employing a HFCVD system. The first step is the growth of CVD diamond in the HFCVD reactor. In the second step, the samples were treated in a saturated solution of H(2)SO(4):CrO(3) and rinsed in a (1:1) solution of H(2)O(2): NH(4)OH. After this procedure, a second diamond layer was deposited. The diamond films were analyzed by raman scattering spectroscopy (RSS). scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS). The films showed a high degree of purity with a thickness of 60 mu m, presenting uniform characteristics over a large area. (C) 2009 Elsevier Ltd. All rights reserved. (AU)

• Processo FAPESP: 03/08930-5 - Crescimento de diamante-CVD em grandes áreas em reator assistido por filamento quente
• Beneficiário: João Roberto Moro
• Modalidade de apoio: Auxílio à Pesquisa - Regular