| Full text | |
| Author(s): |
Amorim, A.
[1, 2]
;
Nascente, P. A. P.
[3]
;
Trava-Airoldi, V. J.
[4]
;
Corat, E. J.
[4]
;
Alves, A. R.
[1]
;
Moro, J. R.
[1]
Total Authors: 6
|
| Affiliation: | [1] Univ Sao Francisco, PPGSS Engn & Ciencia Mat, BR-13251900 Itatiba, SP - Brazil
[2] FATEC, BR-13801005 Mogi Mirim, SP - Brazil
[3] Univ Fed Sao Carlos, Dept Mat Engn, BR-13565905 Sao Carlos, SP - Brazil
[4] Inst Nacl Pesquisas Espaciais, Lab Assoc Sensores & Mat, BR-12227970 Sao Jose Dos Campos, SP - Brazil
Total Affiliations: 4
|
| Document type: | Journal article |
| Source: | VACUUM; v. 83, n. 7, p. 1054-1056, MAR 24 2009. |
| Web of Science Citations: | 4 |
| Abstract | |
This paper reports the results of a two-step hot filament chemical vapor deposition method to improve the quality of diamond films. Diamond films were deposited on a Si(100) substrate having an area of 45 cm(2) and a thickness of 60 mu m. employing a HFCVD system. The first step is the growth of CVD diamond in the HFCVD reactor. In the second step, the samples were treated in a saturated solution of H(2)SO(4):CrO(3) and rinsed in a (1:1) solution of H(2)O(2): NH(4)OH. After this procedure, a second diamond layer was deposited. The diamond films were analyzed by raman scattering spectroscopy (RSS). scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS). The films showed a high degree of purity with a thickness of 60 mu m, presenting uniform characteristics over a large area. (C) 2009 Elsevier Ltd. All rights reserved. (AU) | |