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(Referência obtida automaticamente do Web of Science, por meio da informação sobre o financiamento pela FAPESP e o número do processo correspondente, incluída na publicação pelos autores.)

The influence of the film thickness of nanostructured alpha-Fe2O3 on water photooxidation

Texto completo
Autor(es):
Souza, Flavio Leandro [1] ; Lopes, Kirian Pimenta [1] ; Longo, Elson [1] ; Leite, Edson Roberto [1]
Número total de Autores: 4
Afiliação do(s) autor(es):
[1] Univ Fed Sao Carlos, Dept Chem, LIEC CDMDC, BR-13565905 Sao Carlos, SP - Brazil
Número total de Afiliações: 1
Tipo de documento: Artigo Científico
Fonte: Physical Chemistry Chemical Physics; v. 11, n. 8, p. 1215-1219, 2009.
Citações Web of Science: 78
Resumo

The present work shows the influence of the film thickness in the optical and photoelectrochemical properties of nanostructured alpha-Fe(2)O(3) thin film. We found that the film thickness has a strong influence on the optical absorption and the results here reported can help in the design of nanostructured alpha-Fe(2)O(3) with superior performance for water photo-oxidation. The results show that the optical property of the hematite film is affected by the film thickness, probably due to the stress induced by the strong interaction between film and substrate. This stress generates defects in the crystal lattice of the hematite film, increasing the (e(-))-(h(+)) recombination process. (AU)

Processo FAPESP: 98/14324-0 - Multidisciplinary Center for Development of Ceramic Materials
Beneficiário:Elson Longo da Silva
Linha de fomento: Auxílio à Pesquisa - Centros de Pesquisa, Inovação e Difusão - CEPIDs