The influence of the film thickness of nanostructured alpha-Fe2O3 on water photooxidation

Autor(es)

Souza, Flavio Leandro ^[1] ; Lopes, Kirian Pimenta ^[1] ; Longo, Elson ^[1] ; Leite, Edson Roberto ^[1]

Afiliação do(s) autor(es)

^[1] Univ Fed Sao Carlos, Dept Chem, LIEC CDMDC, BR-13565905 Sao Carlos, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: Physical Chemistry Chemical Physics; v. 11, n. 8, p. 1215-1219, 2009.
• Citações Web of Science: 78

Resumo

The present work shows the influence of the film thickness in the optical and photoelectrochemical properties of nanostructured alpha-Fe(2)O(3) thin film. We found that the film thickness has a strong influence on the optical absorption and the results here reported can help in the design of nanostructured alpha-Fe(2)O(3) with superior performance for water photo-oxidation. The results show that the optical property of the hematite film is affected by the film thickness, probably due to the stress induced by the strong interaction between film and substrate. This stress generates defects in the crystal lattice of the hematite film, increasing the (e(-))-(h(+)) recombination process. (AU)

• Processo FAPESP: 98/14324-0 - Multidisciplinary Center for Development of Ceramic Materials
• Beneficiário: Elson Longo da Silva
• Modalidade de apoio: Auxílio à Pesquisa - Centros de Pesquisa, Inovação e Difusão - CEPIDs