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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

The influence of the film thickness of nanostructured alpha-Fe2O3 on water photooxidation

Full text
Author(s):
Souza, Flavio Leandro [1] ; Lopes, Kirian Pimenta [1] ; Longo, Elson [1] ; Leite, Edson Roberto [1]
Total Authors: 4
Affiliation:
[1] Univ Fed Sao Carlos, Dept Chem, LIEC CDMDC, BR-13565905 Sao Carlos, SP - Brazil
Total Affiliations: 1
Document type: Journal article
Source: Physical Chemistry Chemical Physics; v. 11, n. 8, p. 1215-1219, 2009.
Web of Science Citations: 78
Abstract

The present work shows the influence of the film thickness in the optical and photoelectrochemical properties of nanostructured alpha-Fe(2)O(3) thin film. We found that the film thickness has a strong influence on the optical absorption and the results here reported can help in the design of nanostructured alpha-Fe(2)O(3) with superior performance for water photo-oxidation. The results show that the optical property of the hematite film is affected by the film thickness, probably due to the stress induced by the strong interaction between film and substrate. This stress generates defects in the crystal lattice of the hematite film, increasing the (e(-))-(h(+)) recombination process. (AU)

FAPESP's process: 98/14324-0 - Multidisciplinary Center for Development of Ceramic Materials
Grantee:Elson Longo da Silva
Support type: Research Grants - Research, Innovation and Dissemination Centers - RIDC