| Texto completo | |
| Autor(es): |
Malheiros-Silveira, Gilliard N.
[1]
;
Finardi, Celio A.
[2]
;
Burger, Talita S.
[3]
;
Van Etten, Eliana A. M. A.
[3]
;
da Silva, Ricardo C. G.
[3]
;
Coelho, Artur V. P.
[3]
;
Daltrini, Andre M.
[3]
;
Panepucci, Roberto R.
[2]
Número total de Autores: 8
|
| Afiliação do(s) autor(es): | [1] Sao Paulo State Univ, UNESP, Campus Sao Joao da Boa Vista, BR-13876750 Sao Paulo - Brazil
[2] Renato Archer Informat Technol Ctr, Hardwam & Syst Design Div, BR-13069901 Campinas, SP - Brazil
[3] CEITEC SA Semicond, Porto Alegre, RS - Brazil
Número total de Afiliações: 3
|
| Tipo de documento: | Artigo Científico |
| Fonte: | APPLIED OPTICS; v. 58, n. 27, p. 7331-7335, SEP 20 2019. |
| Citações Web of Science: | 0 |
| Resumo | |
We performed an end-to-end process, ranging from design, fabrication, and characterization of integrated polymeric optical devices under a mass production technology. Inverted rib waveguides formed by SU-8 photoresist deposited on top of full wafers, with trenches in silica, were used as a platform to implement such optical devices. Narrowband spectral filters based on microracetrack resonators and diplexers based on directional couplers, both with high extinction ratios, are demonstrated. Full wafers of those devices were processed in a complementary metal-oxide-semiconductor foundry's 150 mm-facility. We believe the results are promising for applications ranging from telecommunication components to sensing devices. (C) 2019 Optical Society of America (AU) | |
| Processo FAPESP: | 09/54045-0 - EMU: gerador de padrões ópticos para máscaras litográficas e escrita direta |
| Beneficiário: | Roberto Ricardo Panepucci |
| Modalidade de apoio: | Auxílio à Pesquisa - Programa Equipamentos Multiusuários |
| Processo FAPESP: | 13/07559-3 - Instituto Brasileiro de Neurociência e Neurotecnologia - BRAINN |
| Beneficiário: | Fernando Cendes |
| Modalidade de apoio: | Auxílio à Pesquisa - Centros de Pesquisa, Inovação e Difusão - CEPIDs |