Study of conditions for anisotropic plasma etching of tungsten nitride using sf6/ar gas mixtures.

Grant number:	02/06658-3
Support Opportunities:	Regular Research Grants - Publications - Scientific article
Start date:	August 01, 2002
End date:	January 31, 2003
Field of knowledge:	Engineering - Electrical Engineering - Electrical Materials

Principal Investigator:	Jacobus Willibrordus Swart
Grantee:	Jacobus Willibrordus Swart

Host Institution:	Faculdade de Engenharia Elétrica e de Computação (FEEC). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil

Articles published in Agência FAPESP Newsletter about the research grant:

TITULO

Articles published in other media outlets ( ):

More items Less items

VEICULO: TITULO (DATA)