1) modification of the dielectric constant of silicon dioxide by means of ion implantation.

Grant number:	99/03994-8
Support Opportunities:	Research Grants - Meeting - Abroad
Start date:	July 18, 1999
End date:	July 23, 1999
Field of knowledge:	Engineering - Electrical Engineering - Electrical Materials

Principal Investigator:	Jacobus Willibrordus Swart
Grantee:	Jacobus Willibrordus Swart

Host Institution:	Faculdade de Engenharia Elétrica e de Computação (FEEC). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil

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