Deep trench etching in silicon with fluorine containing plasmas.

Grant number:	95/00220-0
Support Opportunities:	Research Grants - Meeting - Abroad
Start date:	April 05, 1995
End date:	April 07, 1995
Field of knowledge:	Engineering - Electrical Engineering - Electrical Materials

Principal Investigator:	Patrick Bernard Verdonck
Grantee:	Patrick Bernard Verdonck

Host Institution:	Escola Politécnica (EP). Universidade de São Paulo (USP). São Paulo , SP, Brazil

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