Plasma optical emissions and growth rate analysis of TiO2 films

• Grant number: 18/23825-9
• Support Opportunities: Scholarships in Brazil - Scientific Initiation
• Start date: February 01, 2019
• End date: December 31, 2019
• Field of knowledge: Engineering - Materials and Metallurgical Engineering - Nonmetallic Materials
• Principal Investigator: Jose Humberto Dias da Silva
• Grantee: João Saccoman
• Host Institution: Faculdade de Ciências (FC). Universidade Estadual Paulista (UNESP). Campus de Bauru. Bauru , SP, Brazil

Abstract

Titanium dioxide films (TiO2) have a bold interest in biomedical applications, special for coating surfaces of pieces used in front edge implant technologies. In this research, TiO2 films will be deposited using the reactive sputtering technique. A pure metallic Ti target and an atmosphere composed by O2 and Ar gases will be used on depositions. The optical emission spectra will be monitored during the film growth processes. The spectral lines from Ar and Ti will be monitored together with the 777.4 nm oxygen line, as a function of the growth time. The deposition rates, as a function of the gas flux and deposition power, will be measured using a quartz crystal microbalance and analyzed together with the selected optical emission lines. The data will be analyzed seeking a better understanding and optimization of the growth processes of TiO2 films.