Feasibility of RF Sputtering and PIIID for Production of Thin Films from Red Mud

Author(s)

Pereira Antunes, Maria Lucia ^[1] ; da Cruz, Nilson Cristino ^[1] ; Delgado, Adriana de Oliveira ^[2] ; Durrant, Steven Frederick ^[1] ; Ribeiro Bortoleto, Jose Roberto ^[1] ; Lima, Vivian Faria ^[1] ; Santana, Pericles Lopes ^[1] ; Caseli, Luciano ^[3] ; Rangel, Elidiane Cipriano ^[1]

Affiliation

^[1] Univ Estadual Paulista UNESP, BR-18087180 Sorocaba, SP - Brazil

^[2] Univ Fed Sao Carlos UFSCAR, BR-18052780 Sorocaba, SP - Brazil

^[3] Univ Fed Sao Paulo UNIFESP, BR-09972970 Diadema, SP - Brazil

• Document type: Journal article
• Source: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 17, n. 5, p. 1316-1323, SEP-OCT 2014.
• Web of Science Citations: 1

Abstract

During the extraction of aluminum from bauxite, a waste of oxides containing traces of heavy metals in a highly alkaline matrix, called Red Mud (RM), is produced. In this study RM is characterized and the feasibility of using it as a precursor for the production of thin films by Plasma Sputtering and by Plasma Immersion Ion Implantation and Deposition (PIIID) is demonstrated. The chemical structure and composition, surface morphology, topography, and wettability of the films prepared using such methodologies were investigated. The films consist mainly of the elements aluminum, silicon, iron and carbon. Infrared spectroscopic analyses reveal the presence of C=O, C-H-2, Fe(OH), Al-O and Si-C functionalities. RF Sputtering produced films with smoother surfaces, whereas PIIID produced granular surface structures. Surface contact angle measurements showed that despite the presence of oxides and hydroxides, the films are hydrophobic, thus exhibiting an interesting link between the physical and thermodynamical properties. (AU)

• FAPESP's process: 13/06210-7 - Red mud application for deposition of plasma films
• Grantee: Vivian Farias de Lima
• Support Opportunities: Scholarships in Brazil - Scientific Initiation
• FAPESP's process: 12/14708-2 - Integrated plasma processes for Superhydrophobic pattern construction on the polyamide surface
• Grantee: Elidiane Cipriano Rangel da Cruz
• Support Opportunities: Regular Research Grants