| Full text | |
| Author(s): |
Cirino, Giuseppe A.
;
Montagnoli, Arlindo N.
;
Verdonck, Patrick
;
Neto, Luiz G.
;
Thienpont, H
;
Mohr, J
;
Zappe, H
;
Nakajima, H
Total Authors: 8
|
| Document type: | Journal article |
| Source: | MICRO-OPTICS 2012; v. 8428, p. 9-pg., 2012-01-01. |
| Abstract | |
In certain applications of MOEMS devices, it is often necessary to produce microlens array structures that concentrate optical power in semiconductor photodetectors. In this work, the design and fabrication of a low f-number cylindrical microlens array is presented. The lenses were fabricated in thick photo resist - 12 mu m thick - using a contact printer exposure through a mask with a repetitive 6 mu m line - 4 mu m space pattern. The width of the resulting microlens array was determined to be 10 mu m, with f-number of 0.5. Numerical calculations based on scalar diffraction theory were employed to model the light propagation inside the resist, determining the aerial image as a function of its thickness. Than the resist response characteristics, expressed by its contrast curve, and absorption rate were used to obtain a cross section profile. A good match between numerical and experimental results were found. (AU) | |
| FAPESP's process: | 08/57858-9 - National Institute for Optics and Photonics |
| Grantee: | Vanderlei Salvador Bagnato |
| Support Opportunities: | Research Projects - Thematic Grants |