| Full text | |
| Author(s): |
Cirino, G. A.
;
Montagnoli, A. N.
;
Neto, L. G.
;
Pavanello, MA
;
Freire, RCS
;
Naviner, JF
;
Bonnaud, O
Total Authors: 7
|
| Document type: | Journal article |
| Source: | MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2011; v. 39, n. 1, p. 8-pg., 2011-01-01. |
| Abstract | |
In this work, the design and fabrication of a low f-number cylindrical microlens array is presented. The lenses were fabricated in thick photo resist of 12 mu m thickness, using a contact printer exposure through a mask with a repetitive 6 mu m line -4 mu m space pattern. Numerical calculations based on scalar diffraction theory were employed to model the light propagation inside the resist, determining the aerial image as a function of its thickness. Than the resist response characteristics, expressed by its contrast curve, and absorption rate were used to obtain a cross section profile. A good match between numerical and experimental results were found. (AU) | |
| FAPESP's process: | 08/57858-9 - National Institute for Optics and Photonics |
| Grantee: | Vanderlei Salvador Bagnato |
| Support Opportunities: | Research Projects - Thematic Grants |