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Structural, optical and transport properties of amorphous semicondutors

Grant number: 97/12069-0
Support type:Research Projects - Thematic Grants
Duration: May 01, 1998 - July 31, 2004
Field of knowledge:Physical Sciences and Mathematics - Physics - Condensed Matter Physics
Principal Investigator:Fernando Alvarez
Grantee:Fernando Alvarez
Home Institution: Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
Co-Principal Investigators:Ivan Emilio Chambouleyron
Associated scholarship(s):04/01977-9 - Nano and microstructure of nitrogen-containing metal alloys implanted by pulsed plasma and ion beam, BP.PD
00/09334-9 - Structural and physical properties of nitrogen-containing materials obtained by ion beam assisted deposition, BP.DR

Abstract

The aim of this proposai is to study the physical properties of amorphous semiconductors belonging to Column IV of the Periodic Table (Si, Ge, C), some of their alioys (SiC., SiGe, CN., GeC,), and the effects of controlled contamination ("doping") with elements of column V and III. The main purpose of the project is to improve the understanding of the electronic, optical, structural and mechanical properties of the materiais, as well as potentiate their use in technological applications. These goals are intimately linked to the scientific tradition of our research group and with the current graduate student programs at the Instituto de Física "Gleb Wataghin". Therefore, the training of student at the three levels, i.e., scientific training for under-graduate students, Master and Ph.D. students, is of fundamental importance to the proposal. To reach these goals, we shall take advantage of our past experience and the existence of modern experimental facilities. The project also considers the upgrading and renewing some experimental facilities. The materiais to be studied will be depositei by the standards techniques currently used in our laboratories, such as thermal evaporation, e-beam, sputtering and plasma assisted chemical vapor deposition. Besides, we shall use a deposition facility recently implemented in our laboratories, that is, the "Dual lon Beam Assisted Deposition" (DIBAD) machine. This facility allows the deposition by DIBAD, and analysis in situ by photoelectron spectroscopy, of bulk semiconductors and interfaces. We shail continue the studies of controlled contamination of Group IV amorphous semiconductors from solid sources and its relationship with the electronic transporta an effort to understand the structural properties will be done using photoelectron spectroscopy. The studies of the eiectron core levels and the valence band will allow us to gain a ciearer physical insight of the local atoms' environments, either in bulk or at the interfaces. Experimental conditions leading to improve the properties of the materiais will be pursued. The influence of hydrogen on the growth mechanisms will be systematically studied in situ on materials depositel by DIBD. In particular, the induced stress, commonly found in amorphous thin films, will be studied together with the elastic properties of the materials. (AU)

Scientific publications (11)
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
ZAGONEL, L. F.; MITTEMEIJER, E. J.; ALVAREZ, F. Microstructure of tool steel after low temperature ion nitriding. MATERIALS SCIENCE AND TECHNOLOGY, v. 25, n. 6, p. 726-732, JUN 2009. Web of Science Citations: 8.
PORTOLAN, E.; BAUMVOL, I. J. R.; FIGUEROA, C. A. Electronic structure and mechanical properties of plasma nitrided ferrous alloys. Applied Surface Science, v. 255, n. 13-14, p. 6661-6665, APR 15 2009. Web of Science Citations: 1.
ZAGONEL, LUIZ F.; BASSO, RODRIGO L. O.; ALVAREZ, FERNANDO. Precipitates Temperature Dependence in Ion Beam Nitrited AISI H13 Tool Steel. Plasma Processes and Polymers, v. 4, n. 1, p. S736-S740, APR 2007. Web of Science Citations: 3.
ZAGONEL‚ L.F.; BASSO‚ R.L.O.; ALVAREZ‚ F. Precipitates Temperature Dependence in Ion Beam Nitrited AISI H13 Tool Steel. Plasma Processes and Polymers, v. 4, n. S1, p. S736-S740, 2007.
ZAGONEL, L. F.; FIGUEROA, C. A.; DROPPA, JR., R.; ALVAREZ, F. Influence of the process temperature on the steel microstructure and hardening in pulsed plasma nitriding. SURFACE & COATINGS TECHNOLOGY, v. 201, n. 1-2, p. 452-457, SEP 12 2006. Web of Science Citations: 41.
FIGUEROA‚ CA; WEBER‚ S.; CZERWIEC‚ T.; ALVAREZ‚ F. Oxygen‚ hydrogen‚ and deuterium effects on plasma nitriding of metal alloys. SCRIPTA MATERIALIA, v. 54, n. 7, p. 1335-1338, 2006.
ZAGONEL‚ LF; FIGUEROA‚ CA; DROPPA‚ R.; ALVAREZ‚ F. Influence of the process temperature on the steel microstructure and hardening in pulsed plasma nitriding. SURFACE & COATINGS TECHNOLOGY, v. 201, n. 1, p. 452-457, 2006.
FIGUEROA‚ CA; ALVAREZ‚ F. New pathways in plasma nitriding of metal alloys. SURFACE & COATINGS TECHNOLOGY, v. 200, n. 1, p. 498-501, 2005.
ZAGONEL, LF; FIGUEROA, CA; ALVAREZ, F. In situ photoemission electron spectroscopy study of nitrogen ion implanted AISI-H13 steel. SURFACE & COATINGS TECHNOLOGY, v. 200, n. 7, p. 2566-2570, 2005. Web of Science Citations: 9.
FIGUEROA, C. A.; OCHOA, E.; ALVAREZ, F. Influence of the ion mean free path and the role of oxygen in nitriding processes. Journal of Applied Physics, v. 94, n. 4, p. 2242-2247, Aug. 2003.
FIGUEROA, C. A.; WISNIVESKY, DANIEL; HAMMER, P.; LACERDA, R. G.; DROPPA, R. JR; MARQUES, F. C.; ALVAREZ, F. A comprehensive nitriding study by low energy ion beam implantation on stainless steel. SURFACE & COATINGS TECHNOLOGY, v. 146-147, p. 405-409, Sept.-Oct. 2001.

Please report errors in scientific publications list by writing to: cdi@fapesp.br.