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Silicon nitride deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromachining applications.

Grant number: 98/10831-5
Support Opportunities:Research Grants - Meeting - Abroad
Start date: September 20, 1998
End date: September 22, 1998
Field of knowledge:Physical Sciences and Mathematics - Physics
Principal Investigator:Roberto Ricardo Panepucci
Grantee:Roberto Ricardo Panepucci
Host Institution: Pessoa Física
Articles published in Agência FAPESP Newsletter about the research grant:
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VEICULO: TITULO (DATA)
VEICULO: TITULO (DATA)