The influence of the interface trap densities on the extraction of the silicon film and front oxide thickness of soi nmos devices at low temperatures.

• Grant number: 02/06043-9
• Support Opportunities: Research Grants - Meeting - Brazil
• Start date: September 09, 2002
• End date: September 14, 2002
• Field of knowledge: Engineering - Electrical Engineering - Electrical Materials
• Principal Investigator: Aparecido Sirley Nicolett
• Grantee: Aparecido Sirley Nicolett
• Host Institution: Faculdade de Tecnologia São Paulo (FATEC São Paulo). Centro Paula Souza (CEETEPS). Secretaria de Desenvolvimento Econômico (São Paulo - Estado). São Paulo , SP, Brazil