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Anodic oxidation with aluminum plasma in an aqueous medium

Grant number: 98/15094-9
Support Opportunities:Research Grants - Innovative Research in Small Business - PIPE
Start date: June 01, 1999
End date: December 31, 1999
Field of knowledge:Engineering - Mining Engineering
Principal Investigator:Gerhard Ett
Grantee:Gerhard Ett
Company:Anod-Arc Indústria, Comércio e Serviços de Manutenção e Revestimento
City: São Paulo

Abstract

This project seeks to obtain compact aluminum oxide layers with a hardness similar to corundum (2300 Hv), through anodic plasma oxidation, in water, of aluminum, other reactive metals, and their alloys. Both the process and the layers obtained bear little resemblance to the traditional process of hard oxidation (maximum 700 Hv 0.5 N). The proposers intend to develop the process and optimize the parameters according to the costs and properties of the layer obtained. Differences in the coefficients of thermal expansion in use and thermal cycling can be corrected by including additional oxide. The relatively low hardness of the layers obtained by hard anodization can be explained by their dentiform structure. It is not proportional to their resistance to wear but is confined to the large number of uses where abrasive grains (or the shape of the contact pieces) enable high punctiform pressure. The structure of the layers obtained by the new process will not suffer from this restriction. (AU)

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