Deposition of DLC (Diamond Like Carbon) films on tool steel AISI D2 and AISI H13, for general industrial applications

• Grant number: 13/22458-9
• Support Opportunities: Scholarships in Brazil - Doctorate
• Start date: January 01, 2014
• End date: November 30, 2016
• Field of knowledge: Engineering - Materials and Metallurgical Engineering - Nonmetallic Materials
• Principal Investigator: Vladimir Jesus Trava-Airoldi
• Grantee: Marco Antonio Ramirez Ramos
• Host Institution: Instituto Nacional de Pesquisas Espaciais (INPE). São José dos Campos , SP, Brazil
• Associated research grant: 12/15857-1 - Scientific studies and innovation application on CVD diamond, DLC and carbon nanostructures obtained by chemical vapor deposition technique, AP.TEM

Abstract

The research of nanostructured materials with advanced properties is a fundamental need for growth and advancement of various branches of the economy and industry. The hydrogenated amorphous carbon (aC: H) is a material which has properties that are attractive from the standpoint of technology such as high hardness, low coefficient of friction, being chemically inert and electrical insulation, bio - compatible, etc. Of such as they are also called diamond -like carbon (DLC - diamond - like Carbon). The biggest downside in the deposition of hard DLC films is related to the low level of adherence of these films on metallic and ceramic substrates, caused by the high voltage (internal and external) compressive these coatings and low density of chemical bonds. One of the most widely used techniques for depositing DLC films is the PECVD technique (Plasma Enhanced Chemical Vapor Deposition). This technique is based on the film deposition using the so-called cold plasma. This type of plasma is called so due to the fact that the kinetic energy (temperature) of the electrons are much higher than that of ions. The PECVD deposition chamber formed by two electrodes of different areas. The smallest, the cathode connects to a source of DC or pulsed - radio frequency. The other electrode (anode) is formed by the walls of the chamber and is grounded. The current source produces plasma between the electrodes. This plasma is generated by collisions of electrons accelerated by a field with atoms and / or molecules of the atmosphere precursor, causing further ionization through various reactions involving electrons, ions, neutral molecules and radicals and ionized. This proposed research project in specific, is directed to the study, with assembly and characterization of deposition systems for growing DLC films of high hardness, very low coefficient of friction and high adhesion on different types of metal substrates like steel for tools generate demand for industrial and space applications. The search for this high grip is based on studying deposition processes interfaces between the DLC film and the metal substrate in an unprecedented way, including those involving the incorporation of nano diamond particles. Different characterizations, such as mechanical, involving hardness, fatigue threshold, the tribological measures as coefficient of friction, wear and grip, and the techniques that involve seeking more fundamental as XPS and SIMS to identify the types of chemical bonds, these densities, etc. will be important parts of this study. (AU)

Scientific publications

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

RAMIREZ, MARCO A. R.; SILVA, PATRICIA C.; CORAT, EVALDO J.; TRAVA-AIROLDI, VLADIMIR J.. An evaluation of the tribological characteristics of DLC films grown on Inconel Alloy 718 using the Active Screen Plasma technique in a Pulsed-DC PECVD system. SURFACE & COATINGS TECHNOLOGY, v. 284, p. 235-239, DEC 25 2015. (13/22458-9)