Controlled radical photopolymerization (CRP2) and 3D printing using novel Ni(II) complexes

• Grant number: 22/16213-2
• Support Opportunities: Scholarships abroad - Research Internship - Doctorate (Direct)
• Start date: June 18, 2023
• End date: June 17, 2024
• Field of knowledge: Physical Sciences and Mathematics - Chemistry
• Principal Investigator: Beatriz Eleutério Goi Carvalho
• Grantee: Naralyne Martins Pesqueira
• Supervisor: Jacques Lalevee
• Host Institution: Faculdade de Ciências e Tecnologia (FCT). Universidade Estadual Paulista (UNESP). Campus de Presidente Prudente. Presidente Prudente , SP, Brazil
• Institution abroad: Université de Haute-Alsace, France
• Associated to the scholarship: 21/11741-8 - Ni(II) complexes for controlled radical photopolymerization reactions (photo-OMRP and CRP2) and application in 3D printing, BP.DD

Abstract

Ni(II) complexes will be synthesized to catalyze Controlled Radical Photopolymerization (CRP2). The proposal extends into three stages, which are completely interconnected in the development process. Initially, the attention will be directed to the Ni(II) complexes bearingSchiff base and non-symmetric NHCs ligands synthesis. New Ni(II) complexes will be characterized by FTIR, UV-Vis, Cyclic Voltammetry, EPR, 1H and 13C NMR techniques, elemental analysis and mass spectrometry. The second stage will be dedicated to the evaluation of the photochemical properties of the nickel-NHC and Schiff bases complexes. Consequently, the high reactivity of these compounds will be demonstrated through some direct laser write experiments, where high-spatial-resolution 3D patterns will be obtained. Therefore, this research paves the way for the development of new organometallic photocatalysts in CRP2 as well as their applications in 3D printing. (AU)