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Developing Sustainable Methods for MXenes and MXene-like Materials: Exploring Physical Vapor Deposition Routes

Grant number: 25/04906-1
Support Opportunities:Scholarships abroad - Research Internship - Post-doctor
Start date: November 01, 2025
End date: October 31, 2026
Field of knowledge:Interdisciplinary Subjects
Principal Investigator:Antonio Riul Júnior
Grantee:Leonardo Mathias Leidens
Supervisor: Yury Gogotsi
Host Institution: Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
Institution abroad: Drexel University, United States  
Associated to the scholarship:23/07552-0 - New synthesis route for MXenes: adding multifunctionality to interfaces and devices, BP.PD

Abstract

MXenes form an emerging class of two-dimensional (2D) transition metal carbides, carbonitrides, and nitrides with unique electrical, chemical, and structural properties, making them highly attractive for numerous technological applications. Their synthesis relies predominantly on chemical etching processes involving hazardous acids, limiting applications, scalability, safety, and industrial viability. To address this limitation, we explore here Physical Vapor Deposition (PVD) as an innovative, acid-free approach to directly synthesize MXenes without intermediate chemical steps. The research during the period abroad will compare traditionally etched MXenes with materials deposited via PVD, analyzing structural integrity, composition, stability, and functional performance. Hands-on training and collaboration with an internationally recognized research group specializing in MXenes will accelerate critical advancements toward establishing the first effective physical synthesis route. Ultimately, this approach seeks to develop a sustainable, scalable method for synthesizing MXenes and MXene-like (coatings providing intermediate and/or tunable properties, bridging gaps between extreme material characteristics and practical application needs) materials, significantly expanding their potential for future industrial and technological applications. (AU)

News published in Agência FAPESP Newsletter about the scholarship:
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