Development and characterization of Plasma Enhanced Chemical Vapor Deposition (PECVD) equipment for thin films deposition with titanium by radio frequency plasma

• Grant number: 07/02959-2
• Support Opportunities: Scholarships in Brazil - Scientific Initiation
• Start date: August 01, 2007
• End date: November 30, 2007
• Field of knowledge: Physical Sciences and Mathematics - Physics - Condensed Matter Physics
• Principal Investigator: Fernando Alvarez
• Grantee: Daniel Lima Monteiro
• Host Institution: Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil

Abstract

During this project, will be developed a PECVD system for deposition of thin films of TiN using alcoxides cantaining Ti, by radiofrequency plasma. After this, the equipment will be improved and characterized in order to obtain control over the quantity of oxygen present to achieve more quality films.