Nano and microstructure of nitrogen-containing metal alloys implanted by pulsed plasma and ion beam

• Grant number: 04/01977-9
• Support Opportunities: Scholarships in Brazil - Post-Doctoral
• Start date: September 01, 2004
• End date: August 31, 2007
• Field of knowledge: Physical Sciences and Mathematics - Physics - Condensed Matter Physics
• Principal Investigator: Fernando Alvarez
• Grantee: Carlos Alejandro Figueroa
• Host Institution: Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
• Associated research grant: 97/12069-0 - Structural, optical and transport properties of amorphous semicondutors, AP.TEM

Scientific publications

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

FIGUEROA‚ CA; WEBER‚ S.; CZERWIEC‚ T.; ALVAREZ‚ F.. Oxygen‚ hydrogen‚ and deuterium effects on plasma nitriding of metal alloys. SCRIPTA MATERIALIA, v. 54, n. 7, p. 1335-1338, 2006. (97/12069-0, 04/01977-9)

FIGUEROA‚ CA; ALVAREZ‚ F.. On the hydrogen etching mechanism in plasma nitriding of metals. Applied Surface Science, v. 253, n. 4, p. 1806-1809, 2006. (04/01977-9)

SHORT‚ KT; ZHANG‚ Z.; FINNIE‚ K.; COLLINS‚ GA; FIGUEROA‚ CA. A new duplex process for corrosion protection by PI³. Materials Letters, v. 62, n. 17, p. 3156-3158, 2008. (05/53926-1, 04/01977-9, 00/09334-9)