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| Author(s): |
Luiz Henrique Galvão Tizei
Total Authors: 1
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| Document type: | Master's Dissertation |
| Press: | Campinas, SP. |
| Institution: | Universidade Estadual de Campinas (UNICAMP). Instituto de Física Gleb Wataghin |
| Defense date: | 2008-12-03 |
| Examining board members: |
Daniel Mário Ugarte;
Gilberto Medeiros Ribeiro;
Eduardo Granado Monteiro da Silva;
Daniela Zanchet;
Fernando Iikawa
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| Advisor: | Daniel Mário Ugarte |
| Abstract | |
The complete characterization of new physical and chemical phenomena in systems of nanometric scale requires the detailed knowledge of: a) atomic structure; b) how chemical composition distribution is redefined by interfaces and surfaces (rougheness, interdiffusion, etc.); and c) how are the electronic properties of the system influenced by those two factors. In this sense, the development of new tools with specific capabilities and well adapted to the analysis of nanosystems is essential. Therefore, characterization and imaging techniques with nanometric spatial resolution must be considered routine necessities. In this graduate work we present, we sought to implement techniques which allow the characterization of small systems with atomic spatial resolution. In this sense, we implemented a method for the qualitative analysis of high resolutions transmission electron microscopy images, which makes possible the objective measurement of chemical composition changes. This measurement is based on changes of the distribution of intensities of an image and results in a map of the chemical composition of the image. This procedure for the quantitative interpretation was used in the study of the morphology of the interfaces of InGaP/GaAs quantum wells (QW) grown by Chemical Beam Epitaxy (CBE). We estimate that our detection limit for chemical variations in this system is 15 %. In this analysis, we measured microscopic structural parameters which allow the comparison of the morphology of different QW. With this data, we concluded that the InGaP/GaAs interface is rougher that the GaAs/InGaP one. Moreover, through the characterization of QWs with different interfacial layers we concluded that the addition of a thin GaP layer reduces roughness. Morphologial results were compared with 6 K photoluminescence experiments, seeking to establish a direct correlation between interface quality and quantum well emission line width. This correlation was not established. We showed that simple structural models are inefficient and that more elaborated models are need for the quantitative interpretation of quantum wells¿ emission line width (AU) | |