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| Author(s): |
Marina Sparvoli de Medeiros
Total Authors: 1
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| Document type: | Master's Dissertation |
| Press: | São Paulo. |
| Institution: | Universidade de São Paulo (USP). Escola Politécnica (EP/BC) |
| Defense date: | 2007-08-07 |
| Examining board members: |
Ronaldo Domingues Mansano;
Lucila Helena Deliesposte Cescato;
Giuseppe Antonio Cirino
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| Advisor: | Ronaldo Domingues Mansano |
| Abstract | |
In this project it has been manufactured diffractive optical elements in three materials, optical glass, Diamond Like Carbon (DLC) and silicon. These elements were applied in phase modulation devices. The extra advantage of silicon and DLC were the amplitude modulation in visible and ultra-violet spectra respectively. The optic glass starts to transmit at the wavelength 277 nm (UV light) and goes till the near infrared in the same way that the Diamond Like Carbon (that starts to transmit in 330 nm). Silicon is a material that starts to transmit in the near infrared (980 nm) and goes till the middle infrared (16000 nm). Both, DLC and optic glass, was opted to developing devices that operate for a 632,8 nm wavelength. Diffractive Optical Elements silicon based had been manufactured to operate in two wavelengths: 1550 nm and 10600 nm. For the manufactured diffractive optical elements, were used process stages of substrate cleanness, films deposition, lithography and hybrid wet and dry plasma etching. The plasma etching stage was the most studied manufacturing process, aiming of optimized it. For this, some studies of materials etching rate with different gases were made with the purpose to find the more adequate parameters of Radio Frequency power and pressure to reduce the process time to obtain the necessary thickness and low surface roughness. The best conditions of plasma etching process were 100 mTorr pressure and Radio Frequency power of 400 W for the glass, 25 mTorr pressure and Radio Frequency power 50 W for the Diamond Like Carbon and the parameters are 100 mTorr pressure and Radio Frequency power 150 W for silicon. Optical analyses of the diffractive optical elements manufactured with these processes had been realized. In the optical analysis of the glass devices with two and four levels of phase modulation was evident that the optic elements had good performance due to uniformity of the projected light intensity in the images and low intensity of the zero order spot, as well the images are focused and defined. For elements manufactured in Diamond Like Carbon, defined and well-focused images had been formed. In an optic analysis of Diamond Like Carbon thin films RMS roughness through the Total Reflectance and the Diffuse Reflectance, was found a value of 18,8 nm roughness, which is below 63 nm limit, what do that the EOD generates an optimized image. (AU) | |