Fabrication and characterization of thallium bromide (TlBr) thin films

Author(s)

Natália Destefano

• Document type: Master's Dissertation
• Press: Ribeirão Preto.
• Institution: Universidade de São Paulo (USP). Faculdade de Filosofia, Ciências e Letras de Ribeirão Preto (PCARP/BC)
• Defense date: 2009-07-31

Examining board members

Marcelo Mulato; Carlos Luiz Ferreira; Josemary Angélica Corrêa Gonçalves

• Advisor: Marcelo Mulato

Abstract

Due to its high atomic number, high mass density and intrinsic band gap, thallium bromide (TlBr) is a promising semiconductor for room temperature operation for ionizing radiation detection. However, there are few works related to the study of this material in the polycrystalline thin film form for production in large areas (~ 40 x 40 cm2 ), as desired by medical applications. In this work, spray pyrolysis and thermal evaporation were used as alternative methods for the deposition of polycrystalline TlBr films. Both techniques present relative low cost and can be expanded for large areas. The aim of this work is to investigate the influence of the main growth conditions on the final structural, optical and electrical TlBr films properties. Films produced by spray pyrolysis used mili-Q water as solvent. The solution (0,10g of TlBr dissolved in 100g of water) was stirred at 70o C. Each deposition was performed maintaining the substrates (1cm2 ) at 100o C, the nitrogen rate at 8l/min and the solution flow at 1/90 ml/s approximately. The nozzle-spray to substrate distance was 19 cm. Evaporated TlBr films were grown by resistive thermal evaporation of purified material from a tungsten crucible. The substrate temperature was evaluated from room temperature to 200°C. The separation between evaporation source and substrates, h, and the number of depositions, n, were also varied from 3 cm up to 9 cm and from 1 up to 4, respectively. The structure of the crystals was investigated by X-ray Diffraction, the morphology by Scanning Electron Microscopy and the composition by Energy Dispersive X-Ray Spectroscopy. Optical experiments of absorbance as a function of wavelength were performed to estimate the optical gap of the TlBr films. Electrical resistivities were measured using current versus voltage experiments. The dark current was compared to the current under illumination with a fluorescent lamp (20 watts). Finally, some selected samples were exposed to X-ray in the range of mammography diagnosis. The best properties were obtained for films produced by resistive thermal evaporation. This technique allowed the production of films with thickness of approximately 28 µm, for a unique deposition of 12 minutes. However, bromine has lower vapor pressure than the thallium, what leads to a Br loss of about 10% in the composition of evaporated films. The smallest distribution of cracks and the largest optical gap were obtained for films produced at the lowest deposition rates. This leads also to a higher increase of the ratio between current under irradiation and in the dark, when the films were exposed to X-rays. For films produced at room temperature using sequential depositions, the columnar structure was kept for the superior layers and similar results for all samples were obtained in relation to optical gap and electrical resistivity. Moreover, for the thicker film, an increase of a factor 4 was observed for the ratio between current under irradiation using X-rays in the mammography range in relation to the dark. The higher substrate temperature leads to significant material loss during the evaporation and determined less thick films in relation to the ones deposited at room temperature. Structural and morphological variations were verified for films deposited at different temperatures. Larger gap values were found for 150 and 200ºC. For the electrical characterization of the films deposited at different temperatures an original powder with higher purity would be necessary. Moreover, due to the significant difference between bromine and thallium vapor pressures, better results would probably be obtained by a change to the hot-wall evaporation technique. (AU)

• FAPESP's process: 07/01544-3 - Fabrication and characterization of thallium bromide thin films
• Grantee: Natália Destefano
• Support Opportunities: Scholarships in Brazil - Master