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(Reference retrieved automatically from SciELO through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Estimating the Electrochemically Active Area: Revisiting a Basic Concept in Electrochemistry

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Author(s):
Dyovani Coelho [1] ; Giuliana M. Luiz [2] ; Sergio A. S. Machado [3]
Total Authors: 3
Affiliation:
[1] Universidade de São Paulo. Instituto de Química de São Carlos. Grupo de Materiais Eletroquímicos e Métodos Eletroanalíticos - Brasil
[2] Universidade de São Paulo. Instituto de Química de São Carlos. Grupo de Materiais Eletroquímicos e Métodos Eletroanalíticos - Brasil
[3] Universidade de São Paulo. Instituto de Química de São Carlos. Grupo de Materiais Eletroquímicos e Métodos Eletroanalíticos - Brasil
Total Affiliations: 3
Document type: Journal article
Source: Journal of the Brazilian Chemical Society; v. 32, n. 10, p. 1912-1917, Out. 2021.
Web of Science Citations: 0
Abstract

The well-known electrochemical probe Fe(CN)63-/Fe(CN)64- is widely used for estimating the electrochemically active area of electrodes modified with carbon nanotubes, conductive polymers, enzymes, etc. In this study, we used the platinum electrode, smooth or platinized with different roughness factors, to demonstrate that such a redox couple fails to respond to a surface roughness variation. We determined the roughness factors of the Pt surfaces by atomic force microscopy (AFM) images, which yielded values between 2.72 and 25.91. Almost the same values were found by using the charge of the hydrogen monolayer desorption obtained from steady-state cyclic voltammetry experiments performed in an acid medium. They were then compared with those provided by peak current in voltammetry or chronoamperometry with Fe(CN)63-/Fe(CN)64- which all yielded values nearly to one. Such comparison demonstrates that the electrochemical behavior of the redox probe is an outer sphere reaction with a quite small interaction with the electrode surface, thus not being suitable to be related with active areas. (AU)

FAPESP's process: 11/07022-4 - Use of underpotential deposition in the dopping of electrodeposited selenium semiconductive films.
Grantee:Dyovani Coelho
Support type: Scholarships in Brazil - Doctorate
FAPESP's process: 13/17053-0 - Development of an electroanalytical methodology for selective doping of electrodeposited selenium semiconducting films based in the underpotential deposition
Grantee:Sergio Antonio Spinola Machado
Support type: Regular Research Grants