The Activation Energy for Nanocrystalline Diamond Films Deposited from an Ar/H-2/CH4 Hot-Filament Reactor

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Author(s):	Barbosa, D. C. ; Melo, L. L. ; Trava-Airoldi, V. J. ; Corat, E. J. Total Authors: 4
Document type:	Journal article
Source:	Journal of Nanoscience and Nanotechnology; v. 9, n. 6, p. 5-pg., 2009-06-01.
Abstract
In this work we have investigated the effect of substrate temperature on the growth rate and properties of nanocrystalline diamond thin films deposited by hot filament chemical vapor deposition (HFCVD). Mixtures of 0.5 vol% CH4 and 25 vol% H-2 balanced with Ar at a pressure of 50 Torr and typical deposition time of 12 h. We present the measurement of the activation energy by accurately controlling the substrate temperature independently of other CVD parameters. Growth rates have been measured in the temperature range from 550 to 800 degrees C. Characterization techniques have involved Raman spectroscopy, high resolution X-ray difractometry and scanning electron microscopy. We also present a comparison with most activation energy for micro and nanocrystalline diamond determinations in the literature and propose that there is a common trend in most observations. The result obtained can be an evidence that the growth mechanism of NCD in HFCVD reactors is very similar to MCD growth. (AU)

FAPESP's process:	01/11619-4 - New materials, studies and innovative applications for CVD diamonds and diamond-like carbon (DLC)
Grantee:	Vladimir Jesus Trava-Airoldi
Support Opportunities:	Research Projects - Thematic Grants