Diffraction-attenuation resistant beams: their higher-order versions and finite-aperture generations

Author(s)

Zamboni-Rached, Michel ; Ambrosio, Leonardo A. ; Hernandez-Figueroa, Hugo E.

• Document type: Journal article
• Source: APPLIED OPTICS; v. 49, n. 30, p. 9-pg., 2010-10-20.

Abstract

Recently, a method for obtaining diffraction-attenuation resistant beams in absorbing media has been developed in terms of suitable superposition of ideal zero-order Bessel beams. In this work, we show that such beams keep their resistance to diffraction and absorption even when generated by finite apertures. Moreover, we shall extend the original method to allow a higher control over the transverse intensity profile of the beams. Although the method is developed for scalar fields, it can be applied to paraxial vector wave fields, as well. These new beams have many potential applications, such as in free-space optics, medical apparatus, remote sensing, and optical tweezers. (C) 2010 Optical Society of America (AU)

• FAPESP's process: 05/51689-2 - Optics and Photonics Research Center at UNICAMP
• Grantee: Hugo Luis Fragnito
• Support Opportunities: Research Grants - Research, Innovation and Dissemination Centers - RIDC