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(Reference retrieved automatically from Google Scholar through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Magnetic suppression of secondary electrons in plasma immersion ion implantation

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Author(s):
Tan‚ I.H. ; Ueda‚ M. ; Dallaqua‚ R.S. ; Rossi‚ J.O.
Total Authors: 4
Document type: Journal article
Source: Applied Physics Letters; v. 86, n. 2, p. 023509-023509, 2005.