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(Reference retrieved automatically from SciELO through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Preparation and characterization of nanocrystalline h-BN films prepared by PECVD method

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Author(s):
J. Vilcarromero [1] ; M.N.P. Carreño [2] ; I. Pereyra [3] ; N. C. Cruz [4] ; E.C. Rangel [5]
Total Authors: 5
Affiliation:
[1] University of São Paulo - Brasil
[2] University of São Paulo - Brasil
[3] University of São Paulo - Brasil
[4] Universidade Estadual Paulista. Faculdade de Engenharia. DFQ - Brasil
[5] Universidade Estadual Paulista. Faculdade de Engenharia. DFQ - Brasil
Total Affiliations: 5
Document type: Journal article
Source: Brazilian Journal of Physics; v. 32, p. 372-375, 2002-06-00.
Abstract

This work describes a systematic study of the preparation of nano-crystalline thin h-BN films by Plasma-Enhanced Chemical Vapor Deposition (PECVD) technique. The samples were prepared at low temperatures using B2H6 and N2 as gas precursors. It is shown that the flow ratio among these gases has an important influence on the size of the crystallites (deduced by Raman spectroscopy). The 2H6/N2 flow ratio was varied from 1,6 x 10-2 to 6.7 x 10-4 leading to films presenting a crystallite size, which varied from 90 nm to amorphous, respectively. The XRD spectra show two peaks at 2 values around 42° and 44°, which are associated to <img src="http:/img/fbpe/bjp/v32n2a/menor.gif"> 110 <img src="http:/img/fbpe/bjp/v32n2a/maior.gif"> and <img src="http:/img/fbpe/bjp/v32n2a/menor.gif"> 100 <img src="http:/img/fbpe/bjp/v32n2a/maior.gif"> h-BN crystalline directions, indicating, a <img src="http:/img/fbpe/bjp/v32n2a/menor.gif"> 002 <img src="http:/img/fbpe/bjp/v32n2a/maior.gif"> preferential orientation for the h-BN crystallites. The thermo-mechanical properties, as stress, hardness, and Young modulus were also studied and correlated with the structural properties. The composition of the films was obtained by RBS and EDS indicating Boron to Nitrogen ratio, close to stoichiometry for all the studied deposition conditions. (AU)