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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Effect of the cathodic polarization on structural and morphological proprieties of FTO and ITO thin films

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Pla Cid, C. C. [1] ; Spada, E. R. [2, 1] ; Sartorelli, M. L. [1]
Total Authors: 3
[1] Univ Fed Santa Catarina, Dept Fis, LabSiN, BR-88040900 Florianopolis, SC - Brazil
[2] Univ Sao Paulo, Inst Fis Sao Carlos, BR-13560970 Sao Carlos, SP - Brazil
Total Affiliations: 2
Document type: Journal article
Source: Applied Surface Science; v. 273, p. 603-606, MAY 15 2013.
Web of Science Citations: 8

This paper deals on the influence of the potentiodynamic stress on structural and morphological proprieties of fluorine-doped tin oxide (FTO, SnO2:F) and indium tin oxide (ITO, In2O3:Sn) commercial substrates. The potential range is between 0.0 and -2.0 (V/SCE) using an electrolyte with neutral pH. The electrochemical behavior was investigated from cyclic voltammetry technique and chronopotentiometric curves. These electrochemical results were associated to the X-ray diffraction (XRD) spectra and morphology images acquired by scanning electron microscopy (SEM). The main results show that structural and morphological properties of FTO substrates after cathodic polarization remain near constant when compared with ITO films. The ITO substrates show morphological changes after treatment and the XRD patterns indicate the formation of a crystalline structure with In metallic characteristic, at neutral pH. (C) 2013 Elsevier B.V. All rights reserved. (AU)

FAPESP's process: 11/11065-0 - Hybrid solar cells: architecture-based photonic and plasmonic effects
Grantee:Edna Regina Spada
Support type: Scholarships in Brazil - Post-Doctorate