Scientific MUE: acquisition of a 100 kV electron beam nanolithography system for high-throughput and high-precision devices fabrication

• Grant number: 22/11526-2
• Support Opportunities: Research Infrastructure Program - Scientific
• Start date: August 01, 2023
• End date: July 31, 2030
• Field of knowledge: Interdisciplinary Subjects
• Principal Investigator: Newton Cesario Frateschi
• Grantee: Newton Cesario Frateschi
• Host Institution: Centro de Componentes Semicondutores (CCS). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
• Associated researchers: Ben-Hur Viana Borges ; Christiano José Santiago de Matos ; Euclydes Marega Junior ; Felippe Alexandre Silva Barbosa ; Francisco Paulo Marques Rouxinol ; Gustavo Silva Wiederhecker ; Jose Alexandre Diniz ; Marcelo Martinelli ; Thiago Pedro Mayer Alegre

Abstract

Nanofabrication techniques have played a key role in the investigation of new materials and their transformation into technology enabling devices. At the core of this technology is the lithography process, where a desired pattern is transferred to a thin film atop of a suitable substrate wafer (e.g., silicon, III-V materials, lithium niobate etc). To achieve the nanometer resolution necessary to reach trillions of transistors in a single chip, to pattern tiny Josephson junctions for superconducting qubits, or to create nanometer scale photonics crystals in integrates devices there are two possible routes: Deep Ultra-Violet (DUV) optical lithography or electron beam (eBeam) lithography. When targeting academic or small-scale production environment the most affordable alternative is to use a direct writing approach provided by eBeam lithography system. Such tools can offer very high spatial resolution enabling the fabrication of sub-20 nm features while covering a large area (up to 8-inch wafers). This strategy significantly reduces fabrication costs and time while adding the necessary flexibility typical of an academic or small-scale production environment. Based on a decade experience of operation by CCSNano of a research level eBeam, in this proposal we aim to install a semi-industrial high-end eBeam lithography tool able to provide high resolution, high throughput and large area nanolithography that should leverage the research in São Paulo State to be competitive with world-class institutions in a variety of fields such as quantum information science, integrated photonics, spintronics, nanoelectronics, optomechanics, microfluidic and material science. (AU)

Scientific publications

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

DE OLIVEIRA, RAPHAELA; YOSHIDA, ANA B. BARBOSA; RABAHI, CESAR R.; FREITAS, RAUL; TEIXEIRA, VERONICA C.; DE MATOS, CHRISTIANO J. S.; GOBATO, YARA GALVAO; BARCELOS, INGRID D.; CADORE, ALISSON R.. Ultrathin natural biotite crystals as a dielectric layer for van der Waals heterostructure applications. Nanotechnology, v. 35, n. 50, p. 11-pg., 2024-12-09. (15/13771-0, 19/14017-9, 22/11526-2, 14/07375-2, 22/08329-0, 22/10340-2, 22/02901-4)