| Grant number: | 22/11526-2 |
| Support Opportunities: | Research Infrastructure Program - Scientific |
| Start date: | August 01, 2023 |
| End date: | July 31, 2030 |
| Field of knowledge: | Interdisciplinary Subjects |
| Principal Investigator: | Newton Cesario Frateschi |
| Grantee: | Newton Cesario Frateschi |
| Host Institution: | Centro de Componentes Semicondutores (CCS). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil |
| City of the host institution: | Campinas |
| Associated researchers: | Ben-Hur Viana Borges ; Christiano José Santiago de Matos ; Euclydes Marega Junior ; Felippe Alexandre Silva Barbosa ; Francisco Paulo Marques Rouxinol ; Gustavo Silva Wiederhecker ; Jose Alexandre Diniz ; Marcelo Martinelli ; Thiago Pedro Mayer Alegre |
| Associated scholarship(s): | 25/25979-7 - Commissioning of high-end e-beam lithography system, BP.TT |
Abstract
Nanofabrication techniques have played a key role in the investigation of new materials and their transformation into technology enabling devices. At the core of this technology is the lithography process, where a desired pattern is transferred to a thin film atop of a suitable substrate wafer (e.g., silicon, III-V materials, lithium niobate etc). To achieve the nanometer resolution necessary to reach trillions of transistors in a single chip, to pattern tiny Josephson junctions for superconducting qubits, or to create nanometer scale photonics crystals in integrates devices there are two possible routes: Deep Ultra-Violet (DUV) optical lithography or electron beam (eBeam) lithography. When targeting academic or small-scale production environment the most affordable alternative is to use a direct writing approach provided by eBeam lithography system. Such tools can offer very high spatial resolution enabling the fabrication of sub-20 nm features while covering a large area (up to 8-inch wafers). This strategy significantly reduces fabrication costs and time while adding the necessary flexibility typical of an academic or small-scale production environment. Based on a decade experience of operation by CCSNano of a research level eBeam, in this proposal we aim to install a semi-industrial high-end eBeam lithography tool able to provide high resolution, high throughput and large area nanolithography that should leverage the research in São Paulo State to be competitive with world-class institutions in a variety of fields such as quantum information science, integrated photonics, spintronics, nanoelectronics, optomechanics, microfluidic and material science. (AU)
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