Scientific MUE: acquisition of a 100 kV electron beam nanolithography system for high-throughput and high-precision devices fabrication

• Grant number: 22/11526-2
• Support Opportunities: Research Infrastructure Program - Scientific
• Start date: August 01, 2023
• End date: July 31, 2030
• Field of knowledge: Interdisciplinary Subjects
• Principal Investigator: Newton Cesario Frateschi
• Grantee: Newton Cesario Frateschi
• Host Institution: Centro de Componentes Semicondutores (CCS). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
• Associated researchers: Ben-Hur Viana Borges ; Christiano José Santiago de Matos ; Euclydes Marega Junior ; Felippe Alexandre Silva Barbosa ; Francisco Paulo Marques Rouxinol ; Gustavo Silva Wiederhecker ; Jose Alexandre Diniz ; Marcelo Martinelli ; Thiago Pedro Mayer Alegre

Abstract

Nanofabrication techniques have played a key role in the investigation of new materials and their transformation into technology enabling devices. At the core of this technology is the lithography process, where a desired pattern is transferred to a thin film atop of a suitable substrate wafer (e.g., silicon, III-V materials, lithium niobate etc). To achieve the nanometer resolution necessary to reach trillions of transistors in a single chip, to pattern tiny Josephson junctions for superconducting qubits, or to create nanometer scale photonics crystals in integrates devices there are two possible routes: Deep Ultra-Violet (DUV) optical lithography or electron beam (eBeam) lithography. When targeting academic or small-scale production environment the most affordable alternative is to use a direct writing approach provided by eBeam lithography system. Such tools can offer very high spatial resolution enabling the fabrication of sub-20 nm features while covering a large area (up to 8-inch wafers). This strategy significantly reduces fabrication costs and time while adding the necessary flexibility typical of an academic or small-scale production environment. Based on a decade experience of operation by CCSNano of a research level eBeam, in this proposal we aim to install a semi-industrial high-end eBeam lithography tool able to provide high resolution, high throughput and large area nanolithography that should leverage the research in São Paulo State to be competitive with world-class institutions in a variety of fields such as quantum information science, integrated photonics, spintronics, nanoelectronics, optomechanics, microfluidic and material science. (AU)