Selective silicon nitride etching by ecr plasmas using sf6 and nf3 based gas mixtures.

• Grant number: 03/08411-8
• Support Opportunities: Research Grants - Meeting - Abroad
• Start date: November 02, 2003
• End date: November 07, 2003
• Field of knowledge: Engineering - Electrical Engineering - Electrical Materials
• Principal Investigator: Jacobus Willibrordus Swart
• Grantee: Jacobus Willibrordus Swart
• Host Institution: Faculdade de Engenharia Elétrica e de Computação (FEEC). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil