Scholarship 23/00417-0 - Fotônica integrada, Microfabricação - BV FAPESP
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Optimization of Plasma Etching of Lithium Niobate and Silicon Nitride Thin Film

Grant number: 23/00417-0
Support Opportunities:Scholarships in Brazil - Scientific Initiation
Start date: February 01, 2023
End date: May 31, 2025
Field of knowledge:Physical Sciences and Mathematics - Physics - General Physics
Principal Investigator:Felippe Alexandre Silva Barbosa
Grantee:Gustavo Correa
Host Institution: Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
Associated research grant:18/03474-7 - Nonclassical states of light on chip, AP.JP

Abstract

Plasma etching is an essential part of the microfabrication process using thin films since it allows for etching in a preferential direction. We will use RIE and ICP plasma etching to fabricate waveguides and optical cavities in silicon nitride and lithium niobate thin films.

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