| Grant number: | 23/00417-0 |
| Support Opportunities: | Scholarships in Brazil - Scientific Initiation |
| Start date: | February 01, 2023 |
| End date: | May 31, 2025 |
| Field of knowledge: | Physical Sciences and Mathematics - Physics - General Physics |
| Principal Investigator: | Felippe Alexandre Silva Barbosa |
| Grantee: | Gustavo Correa |
| Host Institution: | Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil |
| Associated research grant: | 18/03474-7 - Nonclassical states of light on chip, AP.JP |
Abstract Plasma etching is an essential part of the microfabrication process using thin films since it allows for etching in a preferential direction. We will use RIE and ICP plasma etching to fabricate waveguides and optical cavities in silicon nitride and lithium niobate thin films. | |
| News published in Agência FAPESP Newsletter about the scholarship: | |
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