Electron beam lithography optimization waveguides and optical cavities microfabric...
Optimization of Plasma Etching of Lithium Niobate and Silicon Nitride Thin Film
Grant number: | 21/12438-7 |
Support Opportunities: | Scholarships in Brazil - Master |
Start date: | December 01, 2021 |
End date: | February 28, 2023 |
Field of knowledge: | Physical Sciences and Mathematics - Physics - General Physics |
Principal Investigator: | Felippe Alexandre Silva Barbosa |
Grantee: | Felipe Boechat Mazzi |
Host Institution: | Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil |
Associated research grant: | 18/03474-7 - Nonclassical states of light on chip, AP.JP |
Abstract In this project, we will microfabricate optical cavities optimize the fabrication procedures in order to explore the parametric down conversion (PDC) nonlinear process. We will fabricate the optical cavities on lithium niobate (LiNbO3) thin films by using electron beam lithography and plasma etching. In the second stage, two parameters will be optimized: optical losses (characterized by the measurement of optical quality factor) and phase matching (characterized by dispersion measurement). (AU) | |
News published in Agência FAPESP Newsletter about the scholarship: | |
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