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Electron beam lithography optimization waveguides and optical cavities microfabrication

Grant number: 20/03661-1
Support type:Scholarships in Brazil - Scientific Initiation
Effective date (Start): May 01, 2020
Effective date (End): December 31, 2020
Field of knowledge:Physical Sciences and Mathematics - Physics - General Physics
Principal Investigator:Felippe Alexandre Silva Barbosa
Grantee:Felipe Boechat Mazzi
Home Institution: Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
Associated research grant:18/03474-7 - Nonclassical states of light on chip, AP.JP

Abstract

Electron beam lithography will be a central part of the microfabrication process used at the original young researcher project award. In this type of lithography, an electron beam is focused and scanned over the sample, this writes a pattern in the resist (lithography mask). The control and optimization of this microfabrication step is essential to guarantee the optical quality resulting waveguides and optical cavities.We will work to create the lithography masks on silicon nitride silicon (Si3N4) and lithium niobate (LiNbO3) thin films, which will be used to fabricate the waveguides and optical cavities.