| Grant number: | 22/16377-5 |
| Support Opportunities: | Scholarships in Brazil - Scientific Initiation |
| Start date: | June 01, 2023 |
| End date: | August 27, 2024 |
| Field of knowledge: | Engineering - Chemical Engineering |
| Principal Investigator: | Gustavo Doubek |
| Grantee: | Guilherme Gonçalves Silva |
| Host Institution: | Faculdade de Engenharia Química (FEQ). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil |
| Associated scholarship(s): | 23/12927-3 - Diffusion Barrier Layer Manufactured by Large Area Physical Laser Deposition to use on Solid Oxide Cells, BE.EP.IC |
Abstract As published by the International Energy Agency, the popularization and mass use of systems powered by SOFCs, especially within the mobility sector, face many challenges, one of which is to achieve a life cycle bigger than 10,000 h. Therefore, the main goal of this project is the deposition of Diffusion Barrier Layers (DBLs) which partially block Cr and Ni evaporation at operating temperature.The modified sol-gel process already developed for DBL deposition on ferritic stainless steel (FSS) via spin-coating technique will be explored and improved, as well as a parallel deposition by Electron Beam using 10GDC pellets. A porous FSS and a dense 8YSZ electrolyte will be used as the substrate, both already under development by the research group.Characterizations of the obtained material will be done by SEM-FEG (Morphology and Thickness), EDS (Atomic Composition), XRD (Phase Analysis, Stress, Crystallinity, and Crystallite Size), BET/ASAP (Superficial Specific Area and Porosity), and AFM (Topography and Roughness). | |
| News published in Agência FAPESP Newsletter about the scholarship: | |
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