Memristive behavior of the SnO2/TiO2 interface dep... - BV FAPESP
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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Memristive behavior of the SnO2/TiO2 interface deposited by sol-gel

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Author(s):
Boratto, Miguel H. ; Ramos, Jr., Roberto A. ; Congiu, Mirko ; Graeff, Carlos F. O. ; Scalvi, Luis V. A.
Total Authors: 5
Document type: Journal article
Source: Applied Surface Science; v. 410, p. 278-281, JUL 15 2017.
Web of Science Citations: 10
Abstract

A novel and cheap Resistive Random Access Memory (RRAM) device is proposed within this work, based on the interface between antimony doped Tin Oxide (4%at Sb:SnO2) and Titanium Oxide (TiO2) thin films, entirely prepared through a low-temperature sol gel process. The device was fabricated on glass slides using evaporated aluminum electrodes. Typical bipolar memristive behavior under cyclic voltage sweeping and square wave voltages, with well-defined high and low resistance states (HRS and LRS), and set and reset voltages are shown in our samples. The switching mechanism, explained by charges trapping/de-trapping by defects in the SnO2/TiO2 interface, is mainly driven by the external electric field. The calculated on/off ratio was about 8 x 10(2) in best conditions with good reproducibility over repeated measurement cycles under cyclic voltammetry and about 10(2) under applied square wave voltage. (C) 2017 Elsevier B.V. All rights reserved. (AU)

FAPESP's process: 16/17302-8 - Fabrication of ReRAM memory devices based on CuxS and COS thin films
Grantee:Mirko Congiu
Support Opportunities: Scholarships in Brazil - Post-Doctoral