| Full text | |
| Author(s): |
Crespi, A. E.
[1]
;
Leidens, L. M.
[1]
;
Aguzzoli, C.
[1]
;
Alvarez, F.
[2]
;
Figueroa, C. A.
[1, 3]
Total Authors: 5
|
| Affiliation: | [1] Univ Caxias Do Sul, PGMAT, BR-95070560 Caxias Do Sul - Brazil
[2] Univ Estadual Campinas, IFGW, DFA, BR-13083970 Campinas, SP - Brazil
[3] Plasmar Tecnol Ltda, BR-95030775 Caxias Do Sul - Brazil
Total Affiliations: 3
|
| Document type: | Journal article |
| Source: | VACUUM; v. 144, p. 243-246, OCT 2017. |
| Web of Science Citations: | 4 |
| Abstract | |
Carbonaceous thin films show poor adhesion when deposited on steels. Chromium, titanium, and silicon containing interlayers are generally used in order to prompt adhesion. This work shows a systematic study of the hydrogen effect on the physical-chemical properties of a-SiCx:H interlayers deposited by using hexamethyldisiloxane on AISI 4140 at low temperatures (85 degrees C-180 degrees C). In particular, the effect of the treatment on the adhesion of a-C:H thin films is reported. The results show that hydrogen radically modifies the tribological behavior inducing the adhesion of a-C:H thin films at temperatures as low as 85 degrees C. The adhesion's improvement is associated with the hydrogen chemical etching that seems to remove more silicon than carbon atoms from the outermost face of the a-SiCx:H interlayer promoting the formation of stronger carbon-carbon bonds. The results are also discussed showing the efficiency obtained by the use of the electrostatic confinement deposition technique. (C) 2017 Elsevier Ltd. All rights reserved. (AU) | |
| FAPESP's process: | 12/10127-5 - Research and development of nanostructured materials for electronic and surface physics applications |
| Grantee: | Fernando Alvarez |
| Support Opportunities: | Research Projects - Thematic Grants |