| Full text | |
| Author(s): |
Damm, D. D.
[1, 2]
;
Contin, A.
[3, 1]
;
Cardoso, L. D. R.
[1]
;
Trava-Airoldi, V. J.
[1]
;
Barquete, D. M.
[4]
;
Corat, E. J.
[1]
Total Authors: 6
|
| Affiliation: | [1] Natl Inst Space Res, Sao Jose Dos Campos, SP - Brazil
[2] Sao Paulo Fed Univ, Sao Jose Dos Campos, SP - Brazil
[3] Univ Fed Goias, Goiania, Go - Brazil
[4] Univ Estadual Santa Cruz, Ilheus, BA - Brazil
Total Affiliations: 4
|
| Document type: | Journal article |
| Source: | SURFACE & COATINGS TECHNOLOGY; v. 357, p. 93-102, JAN 15 2019. |
| Web of Science Citations: | 0 |
| Abstract | |
Direct deposition of CVD diamond on steel produces useless diamond film which delaminates on cooling from deposition temperature {[}1-9]. The majority of current research efforts focus on single and multiple intermediate layers for CVD diamond deposition on steel substrate. There are many excellent diffusional barriers to transition metals migration from bulk to substrate surface to form graphitic sp(2) bonds. However, there is no practical solution to the thermal expansion coefficient (TEC) mismatch between diamond and steels. In this work we use a vanadium carbide thermodiffused coating as the intermediate layer between diamond and AISI O1 steel substrate. It acts as a diffusional barrier and mitigates diamond residual stress after cooling from CVD temperature. Increasing vanadium carbide layer thickness creates a transition zone that attenuates diamond residual stress. Up to now, the vanadium carbide is the only single layer barrier able to inhibit graphitic phase formation and mitigate residual stress in diamond films to the level of 0.54 GPa. (AU) | |
| FAPESP's process: | 15/25149-2 - Study of vanadium carbide interface developed by thermodiffusion and laser cladding for HFCVD diamond deposition. |
| Grantee: | Djoille Denner Damm |
| Support Opportunities: | Scholarships in Brazil - Doctorate |
| FAPESP's process: | 12/15857-1 - Scientific studies and innovation application on CVD diamond, DLC and carbon nanostructures obtained by chemical vapor deposition technique |
| Grantee: | Vladimir Jesus Trava-Airoldi |
| Support Opportunities: | Research Projects - Thematic Grants |