Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films

Author(s)

da Silva, F. C. ^{[1, 2]} ; Tunes, M. A. ^[3] ; Edmondson, P. D. ^[4] ; Lima, N. B. ^[5] ; Sagas, J. C. ^[6] ; Fontana, L. C. ^[6] ; Schoen, C. G. ^[1]

Affiliation

^[1] Univ Sao Paulo, Dept Met & Mat Engn, Escola Politecn, Sao Paulo - Brazil

^[2] FATEC COTIA, Ctr Estadual Educ Tecnol Paula Souza CEETEPS, Rua Nelson Raineri 700, BR-06702155 Cotia, SP - Brazil

^[3] Univ Leoben, Chair Nonferrous Met, Leoben - Austria

^[4] Oak Ridge Natl Lab, Mat Sci & Technol Div, Oak Ridge, TN - USA

^[5] Comissao Nacl Energia Nucl SP, Inst Pesquisas Energet & Nucl, Sao Paulo, SP - Brazil

^[6] Univ Estado Santa Catarina, Lab Plasmas Filmes & Superficies, Joinville - Brazil

• Document type: Journal article
• Source: SN APPLIED SCIENCES; v. 2, n. 5 MAY 2020.
• Web of Science Citations: 0

Abstract

Titanium Nitride (TiN) films were obtained using the grid-assisted magnetron sputtering deposition technique on Al substrates in two conditions: under constant and variable nitrogen concentration along the thin solid film thickness. The formation of a film with variable N concentration (herein referred as graded film) was confirmed using energy filtered transmission electron microscopy, X-ray photoelectron spectroscopy and grazing incidence X-ray diffraction. The TiN thin films microstructures were also analysed using scanning and transmission electron microscopies (SEM and TEM). The viability of synthesizing TiN thin films with variable N concentration is herein proposed as an alternative method for tailoring the properties of such functional coating materials. (AU)

• FAPESP's process: 16/05768-2 - Investigation of the plastic anisotropy developed under necking in duplex stainless steels
• Grantee: Claudio Geraldo Schon
• Support Opportunities: Regular Research Grants