Stability of iron chelates during photo -Fenton process: The role of pH, hydroxyl radical attack and temperature

Ahile, Ungwanen J.; Wuana, Raymond A.; Itodo, Adams U.; Sha'Ato, Rufus; Dantas, Renato F.

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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Stability of iron chelates during photo -Fenton process: The role of pH, hydroxyl radical attack and temperature

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Author(s):	Ahile, Ungwanen J. ^[1] ; Wuana, Raymond A. ^[2] ; Itodo, Adams U. ^[2] ; Sha'Ato, Rufus ^[2] ; Dantas, Renato F. ^[3] Total Authors: 5
Affiliation:	^[1] Benue State Univ, Dept Chem, PMB 102119, Makurdi - Nigeria ^[2] Univ Agr, Dept Chem, PMB 2373, Makurdi - Nigeria ^[3] Univ Estadual Campinas, Sch Technol, UNICAMP, Paschoal Marmo 1888, BR-13484332 Limeira, SP - Brazil Total Affiliations: 3
Document type:	Journal article
Source:	JOURNAL OF WATER PROCESS ENGINEERING; v. 36, AUG 2020.
Web of Science Citations:	0
Abstract


FAPESP's process:	14/17774-1 - Influence of the secondary effluent composition on the disinfection by advanced oxidation processes
Grantee:	Renato Falcão Dantas
Support Opportunities:	Research Grants - Young Investigators Grants

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